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Applied Materials (AMAT) 0190-34055 – Remote Plasma Source (RPS) Interconnect/Controller Interface

Original price was: $83,000.00.Current price is: $82,333.00.

  • Brand: Applied Materials (AMAT)
  • Model: 0190-34055
  • Warranty: One Year
  • Condition: 100% New & Original
  • Application: Remote Plasma Source (RPS) Systems / Chamber Cleans
Category: SKU: AMAT 0190-34055 Tag:

Description

1. Product Title

Applied Materials (AMAT) 0190-34055 – Remote Plasma Source (RPS) Interconnect/Controller Interface

 

2. Product Overview

The 0190-34055 is a specialized electronic interface component manufactured for Applied Materials (AMAT) semiconductor processing equipment. This part is primarily utilized within the Remote Plasma Source (RPS) subsystem, which plays a critical role in chamber cleaning and thin-film deposition processes (such as CVD or ALD).

The primary function of the 0190-34055 is to facilitate stable, high-reliability signal transmission between the system’s central controller and the plasma generation hardware. In the high-interference environment of a wafer fabrication tool, this module ensures that timing, power levels, and safety interlocks are precisely communicated. It solves the industrial challenge of maintaining signal integrity near high-frequency RF (Radio Frequency) sources, preventing process deviations and protecting sensitive wafer batches from contamination or improper plasma ignition.

 

3. Technical Specifications

  • Brand: Applied Materials (AMAT)
  • Model: 0190-34055
  • Warranty: One Year
  • Condition: 100% New & Original
  • Application: Remote Plasma Source (RPS) Systems / Chamber Cleans
  • Compatibility: AMAT Centura, Endura, and Producer platforms
  • Interface Type: Multi-pin High-Density Interconnect
  • Material: High-grade industrial polymers and gold-plated contacts for corrosion resistance
  • Voltage Rating: Specifically rated for semiconductor tool control logic

 

4. Key Features & Benefits

  • RF Interference Shielding: The 0190-34055 is designed with advanced shielding properties to prevent electromagnetic interference (EMI) from disrupting the control signals sent to the plasma source.
  • Precision Timing: Enables the micro-second accuracy required for plasma “strike” and “extinguish” cycles, ensuring consistent chamber cleaning and reducing chemical waste.
  • Enhanced Durability: Built to withstand the vacuum environments and thermal cycling common in semiconductor cleanrooms, reducing the Mean Time Between Forced Outage (MTBFO).
  • Plug-and-Play Integration: Designed as a direct-replacement OEM part, ensuring that system calibration remains intact after installation without the need for complex rewiring.

 

5. Application Scenarios

  • CVD Chamber Cleaning: The 0190-34055 is used to control the RPS units that generate fluorine or nitrogen radicals to clean the interior of Chemical Vapor Deposition (CVD) chambers between wafer runs.
  • Atomic Layer Deposition (ALD): Deployed in advanced logic and memory manufacturing where precise plasma-enhanced steps are required for ultra-thin film growth.
  • Etch Process Support: Utilized in semiconductor etching tools to manage the auxiliary plasma sources that prevent polymer buildup on the chamber walls.

 

6. Frequently Asked Questions (FAQ)

  • Q: What is the primary function of the 0190-34055?
    • A: It acts as a critical interface module that connects the tool’s control system to the Remote Plasma Source (RPS), managing power and safety signals.
  • Q: Is 0190-34055 compatible with all AMAT tools?
    • A: While it is used across major platforms like the Producer and Centura, you should verify the specific RPS generator model (e.g., MKS Astron or AE Paramount) to ensure full assembly compatibility.